1932-5150
工程技术
Quarterly
No
J MICRO-NANOLITH MEM
2007
77
UNITED STATES
http://www.spie.org/publications/journals/journal-of-micro/nanolithography-mems-and-moems
较慢,6-12周审稿时间
容易平均录用比例
1.8影响因子
工程：电子与电气小学科
81/125JIF RANK
346总被引频次
月期刊平台服务过的文章录用时间为1-3个月，依据20年经验，经月期刊专家预审通过后的文章，投稿通过率100%以上！
《微纳米光刻机MEMS和MOEMS杂志》（JM3）发表了有关光刻、制造、包装和集成技术的科学、发展和实践的论文，以满足电子、MEMS、MOEMS和光子学行业的需要。这类装置的范围很广，包括生物医学微装置、微流体、传感器和执行器、自适应光学和数字微镜。范围广泛，有助于促进期刊服务的社区之间的协同作用和利益。
https://jm3.msubmit.net/cgi-bin/main.plex
The Journal of Micro-Nanolithography MEMS and MOEMS (JM3) publishes papers on the science, development, and practice of lithographic, fabrication, packaging, and integration technologies necessary to address the needs of the electronics, MEMS, MOEMS, and photonics industries. The wide range of such devices includes biomedical microdevices, microfluidics, sensors and actuators, adaptive optics, and digital micromirrors. The scope is broad to facilitate synergy and interest between the communities served by the journal.
